Abstract
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Article Information:
An Investigation of the Relationship between Resistance and Thickness of Deposited Nickel Thin Film Resistors
Ericam R.R. Mucunguzi-Rugwebe and Michael Josiah Mangala
Corresponding Author: Ericam R.R. Mucunguzi-Rugwebe
Submitted: November 08, 2012
Accepted: February 18, 2013
Published: November 20, 2013 |
Abstract:
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The main purpose of this study is finding the relationship between resistance and thickness of deposited Nickel Thin Film Resistors. It was found that the Sheet Resistance, Rs, is inversely proportional to the thickness of the film on the substrate. It was also observed that when the film thickness is greater than 50 nm, films behave like ordinary resistors. In other words in bulk, films obey Ohm’s law if other physical quantities remain constant.
Key words: Energy dispersive, thin film resistors, X-ray fluorescence analysis, , , ,
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Cite this Reference:
Ericam R.R. Mucunguzi-Rugwebe and Michael Josiah Mangala, . An Investigation of the Relationship between Resistance and Thickness of Deposited Nickel Thin Film Resistors. Research Journal of Applied Sciences, Engineering and Technology, (21): 3922-3926.
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ISSN (Online): 2040-7467
ISSN (Print): 2040-7459 |
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