Home           Contact us           FAQs           
 
   Journal Page   |   Aims & Scope   |   Author Guideline   |   Editorial Board   |   Search
    Abstract
2013 (Vol. 6, Issue: 21)
Article Information:

An Investigation of the Relationship between Resistance and Thickness of Deposited Nickel Thin Film Resistors

Ericam R.R. Mucunguzi-Rugwebe and Michael Josiah Mangala
Corresponding Author:  Ericam R.R. Mucunguzi-Rugwebe 

Key words:  Energy dispersive, thin film resistors, X-ray fluorescence analysis, , , ,
Vol. 6 , (21): 3922-3926
Submitted Accepted Published
November 08, 2012 February 18, 2013 November 20, 2013
Abstract:

The main purpose of this study is finding the relationship between resistance and thickness of deposited Nickel Thin Film Resistors. It was found that the Sheet Resistance, Rs, is inversely proportional to the thickness of the film on the substrate. It was also observed that when the film thickness is greater than 50 nm, films behave like ordinary resistors. In other words in bulk, films obey Ohmís law if other physical quantities remain constant.
Abstract PDF HTML
  Cite this Reference:
Ericam R.R. Mucunguzi-Rugwebe and Michael Josiah Mangala, 2013. An Investigation of the Relationship between Resistance and Thickness of Deposited Nickel Thin Film Resistors.  Research Journal of Applied Sciences, Engineering and Technology, 6(21): 3922-3926.
    Advertise with us
 
ISSN (Online):  2040-7467
ISSN (Print):   2040-7459
Submit Manuscript
   Current Information
   Sales & Services
   Contact Information
  Executive Managing Editor
  Email: admin@maxwellsci.com
  Publishing Editor
  Email: support@maxwellsci.com
  Account Manager
  Email: faisalm@maxwellsci.com
  Journal Editor
  Email: admin@maxwellsci.com
  Press Department
  Email: press@maxwellsci.com
Home  |  Contact us  |  About us  |  Privacy Policy
Copyright © 2009. MAXWELL Science Publication, a division of MAXWELLl Scientific Organization. All rights reserved